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A double barrier memristive device

机译:双屏障忆阻装置

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摘要

We present a quantum mechanical memristive Nb/Al/Al2O3/NbxOy/Au device which consists of an ultra-thin memristive layer (NbxOy) sandwiched between an Al2O3 tunnel barrier and a Schottky-like contact. A highly uniform current distribution for the LRS (low resistance state) and HRS (high resistance state) for areas ranging between 70 μm2 and 2300 μm2 were obtained, which indicates a non-filamentary based resistive switching mechanism. In a detailed experimental and theoretical analysis we show evidence that resistive switching originates from oxygen diffusion and modifications of the local electronic interface states within the NbxOy layer, which influences the interface properties of the Au (Schottky) contact and of the Al2O3 tunneling barrier, respectively. The presented device might offer several benefits like an intrinsic current compliance, improved retention and no need for an electric forming procedure, which is especially attractive for possible applications in highly dense random access memories or neuromorphic mixed signal circuits.
机译:我们提出了一种量子机械忆阻Nb / Al / Al2O3 / NbxOy / Au器件,该器件由夹在Al2O3隧道势垒和肖特基状接触之间的超薄忆阻层(NbxOy)组成。在70RSμm 2 和2300μm 2 之间的区域,获得了LRS(低电阻状态)和HRS(高电阻状态)的高度均匀的电流分布,这表明基于非丝的电阻开关机制。在详细的实验和理论分析中,我们证明了电阻切换源自氧扩散和NbxOy层内局部电子界面态的改变,这分别影响了Au(肖特基)接触和Al2O3隧道势垒的界面性质。 。提出的设备可能会提供一些好处,例如固有电流顺应性,改善的保持力以及不需要电成型过程,这对于在高密度随机存取存储器或神经形态混合信号电路中的可能应用特别有吸引力。

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