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首页> 外文期刊>Journal of Applied Physics >In depth nano spectroscopic analysis on homogeneously switching double barrier memristive devices
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In depth nano spectroscopic analysis on homogeneously switching double barrier memristive devices

机译:均匀切换双势垒忆阻器件的深度纳米光谱分析

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摘要

Memristors based on a double barrier design have been analyzed by various nanospectroscopic methods to unveil details about their microstructure and conduction mechanism. The device consists of an A1O_x tunnel barrier and a NbO_y/Au Schottky barrier sandwiched between the Nb bottom electrode and the Au top electrode. As it was anticipated that the local chemical composition of the tunnel barrier, i.e., oxidation state of the metals as well as concentration and distribution of oxygen ions, has a major influence on electronic conduction, these factors were carefully analyzed. A combined approach was chosen in order to reliably investigate electronic states of Nb and O by electron energy-loss spectroscopy as well as map elements whose transition edges exhibit a different energy range by energy-dispersive X-ray spectroscopy like Au and Al. The results conclusively demonstrate significant oxidation of the bottom electrode as well as a small oxygen vacancy concentration in the Al oxide tunnel barrier. Possible scenarios to explain this unexpected additional oxide layer are discussed and kinetic Monte Carlo simulations were applied in order to identify its influence on conduction mechanisms in the device. In light of the deviations between observed and originally sought layout, this study highlights the robustness of the memristive function in terms of structural deviations of the double barrier memristor device.
机译:已经通过各种纳米光谱方法分析了基于双势垒设计的忆阻器,以揭示有关其微观结构和传导机理的细节。该器件包括一个AlO_x隧道势垒和一个夹在Nb底部电极和Au顶部电极之间的NbO_y / Au肖特基势垒。可以预料,隧道势垒的局部化学成分,即金属的氧化态以及氧离子的浓度和分布,会对电子传导产生重大影响,因此对这些因素进行了仔细的分析。为了通过电子能量损失光谱法可靠地研究Nb和O的电子态,以及通过能量分散X射线光谱法(例如Au和Al),其过渡边缘展现出不同的能量范围的图元素,选择了一种组合方法。结果最终证明了底部电极的显着氧化以及氧化铝隧道势垒中的低氧空位浓度。讨论了解释这种意外的额外氧化物层的可能方案,并应用了动力学蒙特卡洛模拟,以确定其对器件中传导机制的影响。根据观察到的布局和最初寻求的布局之间的偏差,本研究从双势垒忆阻器器件的结构偏差出发,突出了忆阻功能的鲁棒性。

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  • 来源
    《Journal of Applied Physics 》 |2017年第24期| 245307.1-245307.9| 共9页
  • 作者单位

    Synthesis and Real Structure, Faculty of Engineering, Kiel University, Kaiserstr. 2, 24143 Kiel, Germany;

    Nanoelectronics, Faculty of Engineering, Kiel University, Kaiserstr. 2, 24143 Kiel, Germany;

    Faculty for Electrical Engineering and Information Technology, Ruhr Universitaet Bochum,Universitaetsstr. 150,44801 Bochum, Germany;

    Karlsruhe Institute of Technology, Institute of Nanotechnology, Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany;

    Nanoelectronics, Faculty of Engineering, Kiel University, Kaiserstr. 2, 24143 Kiel, Germany;

    Institute for Electron Microscopy and Nanoanalytics, Technical University Graz, Steyrergasse 17, 8010 Graz,Austria;

    Laboratory of Electron Microscopy, Karlsruhe Institute of Technology, Engesserstr. 7, 76131 Karlsruhe,Germany;

    Institute for Electron Microscopy and Nanoanalytics, Technical University Graz, Steyrergasse 17, 8010 Graz,Austria;

    Karlsruhe Institute of Technology, Institute of Nanotechnology, Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany;

    Karlsruhe Institute of Technology, Institute of Nanotechnology, Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany;

    Nanoelectronics, Faculty of Engineering, Kiel University, Kaiserstr. 2, 24143 Kiel, Germany;

    Electrodynamics and Physical Electronics, Brandenburg University of Technology, 03046 Cottbus, Germany;

    Synthesis and Real Structure, Faculty of Engineering, Kiel University, Kaiserstr. 2, 24143 Kiel, Germany;

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