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Metal-Insulator Transition of strained SmNiO3 Thin Films: Structural Electrical and Optical Properties

机译:SmNiO3应变薄膜的金属-绝缘体转变:结构电和光学性质

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摘要

Samarium nickelate (SmNiO3) thin films were successfully synthesized on LaAlO3 and SrTiO3 substrates using pulsed-laser deposition. The Mott metal-insulator (MI) transition of the thin films is sensitive to epitaxial strain and strain relaxation. Once the strain changes from compressive to tensile, the transition temperature of the SmNiO3 samples shifts to slightly higher values. The optical conductivity reveals the strong dependence of the Drude spectral weight on the strain relaxation. Actually, compressive strain broadens the bandwidth. In contrast, tensile strain causes the effective number of free carriers to reduce which is consistent with the d-band narrowing.
机译:使用脉冲激光沉积在LaAlO3和SrTiO3衬底上成功合成了镍酸((SmNiO3)薄膜。薄膜的Mott金属-绝缘体(MI)过渡对外延应变和应变松弛敏感。一旦应变从压缩应变变为拉伸应变,SmNiO3样品的转变温度就会转变为稍高的值。光学传导率揭示了德鲁德光谱权重对应变松弛的强烈依赖性。实际上,压缩应变使带宽变宽。相反,拉伸应变导致自由载流子的有效数量减少,这与d波段变窄是一致的。

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