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Hall sensors batch-fabricated on all-CVD h-BN/graphene/h-BN heterostructures

机译:在全CVD h-BN /石墨烯/ h-BN异质结构上批量制造霍尔传感器

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摘要

The two-dimensional (2D) material graphene is highly promising for Hall sensors due to its potential of having high charge carrier mobility and low carrier concentration at room temperature. Here, we report the scalable batch-fabrication of magnetic Hall sensors on graphene encapsulated in hexagonal boron nitride (h-BN) using commercially available large area CVD grown materials. The all-CVD grown h-BN/graphene/h-BN van der Waals heterostructures were prepared by layer transfer technique and Hall sensors were batch-fabricated with 1D edge metal contacts. The current-related Hall sensitivities up to 97 V/AT are measured at room temperature. The Hall sensors showed robust performance over the wafer scale with stable characteristics over six months in ambient environment. This work opens avenues for further development of growth and fabrication technologies of all-CVD 2D material heterostructures and allows further improvements in Hall sensor performance for practical applications.
机译:二维(2D)材料石墨烯因其在室温下具有高电荷载流子迁移率和低载流子浓度的潜力而非常适合霍尔传感器。在这里,我们报告了使用商用大面积CVD生长材料在六方氮化硼(h-BN)封装的石墨烯上可扩展批量制造磁性霍尔传感器的方法。通过层转移技术制备了全CVD生长的h-BN /石墨烯/ h-BN范德华异质结构,并用一维边缘金属触点批量制造了霍尔传感器。在室温下测量高达97 V / AT的电流相关霍尔灵敏度。霍尔传感器在晶圆规模上表现出强大的性能,并且在周围环境中六个月内具有稳定的特性。这项工作为进一步发展全CVD 2D材料异质结构的生长和制造技术开辟了道路,并为实际应用提供了霍尔传感器性能的进一步改进。

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