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Increasing the density of passive photonic-integrated circuits via nanophotonic cloaking

机译:通过纳米光子掩盖增加无源光子集成电路的密度

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摘要

Photonic-integrated devices need to be adequately spaced apart to prevent signal cross-talk. This fundamentally limits their packing density. Here we report the use of nanophotonic cloaking to render neighbouring devices invisible to one another, which allows them to be placed closer together than is otherwise feasible. Specifically, we experimentally demonstrated waveguides that are spaced by a distance of ∼λ0/2 and designed waveguides with centre-to-centre spacing as small as 600 nm (<λ0/2.5). Our experiments show a transmission efficiency >−2 dB and an extinction ratio >15 dB over a bandwidth larger than 60 nm. This performance can be improved with better design algorithms and industry-standard lithography. The nanophotonic cloak relies on multiple guided-mode resonances, which render such devices very robust to fabrication errors. Our devices are broadly complimentary-metal-oxide-semiconductor compatible, have a minimum pitch of 200 nm and can be fabricated with a single lithography step. The nanophotonic cloaks can be generally applied to all passive integrated photonics.
机译:光子集成设备需要适当间隔,以防止信号串扰。这从根本上限制了它们的堆积密度。在这里,我们报告了使用纳米光子掩盖技术使相邻设备彼此不可见的情况,这使它们比其他可行方法更紧密地放置在一起。具体来说,我们通过实验证明了相隔约λ0/ 2的波导,并设计了中心至中心间距小至600 nm(<λ0/ 2.5)的波导。我们的实验表明,在大于60 nm的带宽上,传输效率> −2 dB,消光比> 15 dB。可以使用更好的设计算法和行业标准的光刻技术来改善此性能。纳米光子披风依赖于多个引导模式共振,这使得此类设备对制造错误非常鲁棒。我们的器件广泛兼容互补金属氧化物半导体,具有200 anm的最小间距,并且可以通过一个光刻步骤进行制造。纳米光子披风通常可应用于所有无源集成光子。

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