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Integrated Amorphous Silicon p-i-n Temperature Sensor for CMOS Photonics

机译:用于CMOS光子的集成非晶硅p-i-n温度传感器

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摘要

Hydrogenated amorphous silicon (a-Si:H) shows interesting optoelectronic and technological properties that make it suitable for the fabrication of passive and active micro-photonic devices, compatible moreover with standard microelectronic devices on a microchip. A temperature sensor based on a hydrogenated amorphous silicon p-i-n diode integrated in an optical waveguide for silicon photonics applications is presented here. The linear dependence of the voltage drop across the forward-biased diode on temperature, in a range from 30 °C up to 170 °C, has been used for thermal sensing. A high sensitivity of 11.9 mV/°C in the bias current range of 34–40 nA has been measured. The proposed device is particularly suitable for the continuous temperature monitoring of CMOS-compatible photonic integrated circuits, where the behavior of the on-chip active and passive devices are strongly dependent on their operating temperature.
机译:氢化非晶硅(a-Si:H)表现出令人感兴趣的光电和技术性能,使其适合制造无源和有源微光子器件,并且与微芯片上的标准微电子器件兼容。本文介绍了一种基于氢化非晶硅p-i-n二极管的温度传感器,该二极管集成在光波导中以用于硅光子学应用。在30°C至170°C的范围内,正向偏置二极管两端的电压降与温度的线性相关性已用于热感测。在34–40 nA的偏置电流范围内,已测得11.9 mV /°C的高灵敏度。所提出的器件特别适合于CMOS兼容光子集成电路的连续温度监控,其中片上有源和无源器件的行为很大程度上取决于其工作温度。

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