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Induced Photonic Response of ZnO Nanorods Grown on Oxygen Plasma-Treated Seed Crystallites

机译:氧等离子体处理的种子微晶上生长的ZnO纳米棒的诱导光子响应

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摘要

We examined the influence of O2 plasma treatment for the ZnO seed layer (SL) crystallites on the material characteristics of ZnO nanorods (NRs) synthesized by the hydrothermal method. Diode photocurrent and photo-response transient characteristics of the p-Si-ZnO-NR heterojunction-based ultraviolet (UV) photodetectors were also examined according to the plasma treatment for the SLs. The superior optical properties of NRs were measured from the photoluminescence by exhibiting 4.6 times greater near-band edge emission when grown on the O2-plasma-treated SL. The degree of (002) orientation of the NR crystals was improved from 0.67 to 0.95, as revealed by X-ray diffraction analysis, and a higher NR surface density of ~80 rods/μm2 with a smaller mean diameter of 65 nm were also observed by the SL modification using plasma-treatment. It was shown by X-ray photo-electron spectroscopy that this improvement of NR crystalline quality was due to the recovery of stoichiometric oxygen with significant reduction of oxygenated impurities in the SL crystals and the subsequent low-energy growth mode for the NRs. UV PDs fabricated by the proposed SL plasma treatment technique showed significantly enhanced UV-to-dark current ratio from 2.0 to 83.7 at a forward bias of +5 V and faster photo-response characteristics showing the reduction in recovery time from 16 s to 9 s.
机译:我们检查了O2等离子体处理ZnO晶种层(SL)晶体对水热法合成的ZnO纳米棒(NRs)的材料特性的影响。根据对SL的等离子体处理,还检查了p-Si / n-ZnO-NR异质结型紫外(UV)光电探测器的二极管光电流和光响应瞬态特性。通过在O2等离子体处理的SL上生长时,显示出4.6倍的近带边缘发射,可从光致发光测量出NR的优异光学性能。 X射线衍射分析表明,NR晶体的(002)取向度从0.67提高到0.95,并且NR表面密度较高,约为〜80棒/μm 2 ,而较小使用等离子体处理的SL修饰也观察到平均直径为65 nm。 X射线光电子能谱表明,NR晶体质量的这种提高是由于化学计量比的氧的回收以及SL晶体中含氧杂质的显着减少以及随后NRs的低能量生长模式。通过建议的SL等离子体处理技术制造的UV PD在+5 V的正向偏压下显示出从2.0到83.7的显着提高的UV暗电流比,以及更快的光响应特性,表明恢复时间从16 s减少到9 s 。

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