反应等离子沉积装置的性能研究

摘要

反应等离子沉积方法具有离子轰击能量低、薄膜沉积时衬底温度低的特点,可应用于太阳电池、LED(OLED)等的高质量透明导电材料的制备,有利于获得高转换效率的太阳电池.对反应等离子沉积系统进行了研究,并在FLD08型RPD设备上,制备了掺钨透明氧化物IWO薄膜材料,获得了较好的结果.%Reactive plasma deposition system has the characteristics of low ion bombardment energy and low sub-strate temperature when the film is deposited. It can be applied to the deposition of transparent conductive materials,and this technology is conducive to high conversion efficiency of solar cells. In this paper,the reaction plasma deposition sys-tem was studied with the RPD equipment of model FLD08. Tungsten doped indium oxide(IWO)thin films were deposit-ed,and good results were obtained.