纳米薄膜厚度标准物质的均匀性及稳定性监测

摘要

In this paper, the composition and chemical state of the nano-iflm thickness reference material which developed by Shanghai Institute of Measurement and Testing Technology are analyzed by using X-ray photoelectron spectroscopy (XPS) method, and the uniformity and stability of iflm thickness are also investigated. The results show that the nano-iflm of the reference material is composed of tantalum pentoxide. The uniformity of the nano-film and the stability of the film during the monitoring period are good. The reference material can be used as the national measurement apparatus for the product quality control, instrument calibration and measurement method validation, which fully meet the requirements of the use of the reference material.%通过选用X射线光电子能谱（XPS）测量方法，对上海市计量测试技术研究院所研制的纳米薄膜厚度标准物质的组成及化合态进行了分析，并考察了薄膜厚度的均匀性和稳定性。实验结果表明，所研制的标准物质的薄膜组成为氧化钽，薄膜的均匀性以及在监测期内的稳定性良好。该标准物质可以作为产品质量控制、设备校准以及测试方法验证的国家计量器具使用，完全满足标准物质使用要求。