PRODUCTION METHOD OF A SINGLE THIN FILM FOR A NONDESTRUCTIVE SENSOR, CAPABLE OF IMPROVING THE STABILITY AND UNIFORMITY OF THE THICKNESS OF THIN FILM

摘要

PURPOSE: A production method of a single thin film for a nondestructive sensor is provided to prevent the unevenness of electroplating deposition thickness of a main pattern by using an Electroplating.;CONSTITUTION: A main pattern(80) and a dummy pattern(90) are designed so that they are formed on a wafer substrate(70). An electroplating is performed according to the shape on a wafer substrate. It is confirmed whether the thickness of a deposited thin film is uniform or not after plating. The dummy patterns are formed at three kind of 3mm,5mm, and 7mm according to the outside of the main pattern. The plating is performed at DC pulsed mode.;COPYRIGHT KIPO 2010