FIB／SEM 双束系统在微纳加工与表征中的应用

摘要

简要回顾了聚焦离子束/扫描电子显微镜双束系统在国家纳米科学中心的应用。围绕透射电镜样品制备、扫描电子显微镜与扫描离子显微镜、纳米材料的二维与三维表征等材料表征，以及离子束直接刻蚀加工如光子晶体阵列器件原型加工、材料沉积加工如用于电学性能测试的四电极制作、指定点加工如原子力显微镜针尖修饰、三维加工、电子束曝光及其与聚焦离子束联合加工等纳米结构加工两方面，以一些具体实例分类进行了介绍。针对限制其应用的一些不利因素，如加工效率低、面积小、精度不足、加工损伤等问题，一些新技术如新型离子源Plasma、 He ＋/Ne ＋离子等与现有 Ga ＋聚焦离子束系统配合将成为未来发展方向。%The applications of Focused Ion Beam ( FIB ) /Scanning Electron Microscopy ( SEM ) DualBeam system at National Center for Nanoscience and Technology for micro-nanofabrication and characterization of nanomaterial are briefly reviewed by means of a lot of typical practical examples.Regarding characterization of nanomaterial, the capabilities, such as TEM sample preparation, Scanning Ion Microscopy (SIM), 2D and 3D characterization of nanomaterial, are illustra-ted.And as for micro-nanofabrication, the applications include:(1) direct milling for nanostructures, for instance, pho-tonic array prototyping;(2) precise material deposition, for example, platinum metal deposition for four-electrode meas-urement;(3) site specific fabrication, such as AFM tip modification;(4)3D nanofabrication;(5) electron beam lithog-raphy (EBL) and its combination with FIB.The application fields of DualBeam system involve material science, electron-ics, life science and natural resources.To extend the application field, a number of new technologies, including various new types ion source, such as plasma, He +and Ne+are expected to be used in the near future to overcome some present disadvantages, for instance, low productivity, small fabrication area, bad fabrication precision, FIB induced damage and so on.