氧化钒薄膜制备后需要进行退火处理以降低非晶态氧化钒薄膜的方阻大小并改善薄膜结晶特性.传统退火方式时间较长且退火过程会导致器件性能降低.本文主要利用激光精确控制的特点处理氧化钒薄膜,通过平顶光路系统改变激光功率、高斯光斑形貌以及光斑的重叠率对氧化钒薄膜进行退火处理,主要研究了激光能量密度以及光斑重叠率对氧化钒薄膜的方阻,表面粗糙度以及结晶度的影响.实验结果表明激光功率为0.7 W,光斑重叠率为93.33%,光斑能量密度为62.2 mJ/cm2时,退火氧化钒薄膜的方阻值明显降低,薄膜表面光滑且氧化钒结晶度较好.%After the preparation of the vanadium oxide thin film,annealing treatment is required to reduce the square resistance of the amorphous vanadium oxide film and improve the film crystallization characteristics. The conventional annealing methods take a long time and the annealing process will lead to the degradation of the device perform-ance. The vanadium oxide thin films by laser precision control is treated by changing the laser power,the Gaussian spot morphology and the overlap rate. The effects of laser energy density and spot overlap rate on the sheet resistance, surface roughness and crystallinity of vanadium oxide thin films were studied. The experimental results show that when the laser power is 0. 7 W,the spot overlap rate is 93. 33% and the spot energy density is 62. 2 mJ/cm2 ,the sheet re-sistance of annealed vanadium oxide thin film is obviously reduced,the surface of the film is smooth,and the crystal-linity of vanadium oxide is better.
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