中频非平衡磁控溅射TiAlN薄膜的结构与性能

摘要

采用中频非平衡磁控溅射离子镀设备在YG10硬质合金表面制备(Ti1-xAlx)N薄膜,运用X线衍射仪、扫描电子显微镜、显微硬度计和材料表面性能测试仪等对薄膜进行表征,分析氮气分压、直流偏压和Al含量对薄膜的力学性能、薄膜成分和组织结构的影响.结果表明:薄膜呈柱状多晶组织,主要组成相为(Ti,Al)N相;随着氮气分压增大,膜层中氮原子增多,而铝、钛原子含量减少,膜层中rAl/(Al+Ti)与r(Al+Ti)/N均下降,薄膜(111)晶面取向减弱,(220)和(200)晶面取向增强.力学性能测试表明,随着膜层中的Al含量和直流偏压升高,薄膜硬度、膜厚和膜-基结合力均呈现先升高后降低的趋势,薄膜显微硬度最高2 915 HV,膜-基结合力最高达73 N.%(Ti1-xAlx)N films were prepared on YG10-cemented tungsten carbide surface by using mid-frequency non-equilibrium magnetron sputtering.The films'' properties were characterized by X-ray diffraction(XRD),scanning electron microscopy(SEM),and microhardness and surface property testing.Effects of nitrogen partial pressure,DC bias voltage,and Al content on the mechanical properties,composition,and microstructure of the films were investigated.The films were composed of (Ti,Al)N columnar crystals.The concentration of nitrogen in the film increased with the increasing of nitrogen partial pressure,while the concentrations of Al and Ti,the atom ratios rAl/(Al+Ti) and r(Al+Ti)/N were decreased.The (111) crystal orientation became less prominent,and the (220)and (200)orientations became predominant.Mechanical testing show that,with the increasing of Al concentration and DC bias voltage,the film hardness and thickness,along with the binding force between the film and substrate,all initially increase and then decrease.The maximum microhardness of the films is 2915 HV,and the maximum binding force between the film and substrate is 73 N.