以化学蚀刻薄化技术为基础,对高铝玻璃进行减薄优化研究.主要讨论最佳减薄溶液下,不同温度,不同减薄溶液的pH值,不同时间对玻璃减薄速率的影响.对减薄后的玻璃基板表面通过SME、EDX检测品质分析.在光刻胶和边框的保护下,配制出最优减薄溶液,选择的工艺条件为pH=2,温度55℃,减薄时间45 min.结果表明:在最佳条件下,玻璃基板减薄速率明显提高,表面的粗糙度得到有效的降低,并减少了表面白色附着物的沉淀.这为平板玻璃、显示屏等行业的制造,提供了一条可行性方案.%On the basis of chemical etching technology,the optimization of the thinning of high alumina glass was studied.Under the protection of the photoresist and sealant,the following results were obtained under pH =2,temperature 55 ℃ and the etching time of 45min.The as-obtained samples were characterized by Field-Emission Scanning Electron Microscope (FE-SEM),Energy Dispersive X-ray Detector (EDX).And a series of conditional experiments were done.Under the optimal conditions,the results showed that the reduction rate of the glass substrate was obviously increased,the surface roughness was effectively reduced,and the precipitation of the white precipitates was decreased.It provides a feasibility plan for flat glass,display panels and other industries manufacturing.
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