氧等离子体辅助脉冲激光沉积法制备PMN-PT薄膜的微观结构和电学性能

摘要

Lead magnesium niobate-lead titanate (PMN-PT) ferroelectric thin films with composition near the morphotropic phase boundary (MPB) were deposited on Si substrate by oxygen plasma assisted pulsed laser deposition (PLD).Highly (001)-oriented PMN-PT thin films with lower oxygen defect and higher crystalline property were obtained.The results show that the microstructure and electrical properties of PMN-PT thin films strongly depend on the partial pressure and the activity of oxygen in the deposition process.With the use of oxygen plasma,the dielectric constant of the PMN-PT thin film is increased from 1484 to 3012,the remnant polarization (2Pr) changes from 18μC/cm2 to 38 μC/cm2.%采用氧等离子体辅助脉冲激光沉积方法(PLD)在硅衬底上,制备出高度(001)取向的钙钛矿相结构钛铌镁酸铅(PMN-PT)薄膜.研究了氧等离子体辅助对PMN-PT薄膜相结构、微观形貌和电学性能的影响.结果表明,通过在薄膜沉积过程中引入高活性的氧等离子,可以有效地提高PMN-PT薄膜的结晶质量和微观结构.未采用氧等离子体辅助PLD方法制备PMN-PT薄膜的介电常数(10 kHz)和剩余极化(2Pr)分别为1484和18 μC/cm2,通过采用氧等离子体辅助,其介电常数和剩余极化分别提高至3012和38 μC/cm2.