不同退火气氛下Bi2NiMnO6薄膜的铁电性能和漏电流研究

摘要

采用化学溶液法以LaNiO3为底电极在Si(100)衬底上生长了Bi2NiMnO6薄膜,分别在N2和O2下对薄膜进行退火,退火温度均为600℃,研究不同退火气氛对薄膜结构与电性能的影响.用XRD测量分析了Bi2NiMnO6薄膜的结构,用铁电性能测量仪表征了样品的铁电性能和漏电流特性.结果表明,在N2或O2气氛下,Bi2NiMnO6薄膜均能成相,所有样品在室温下均表现出铁电性能,同时,这些样品都呈现出相当低的漏电流密度.此外,还讨论了Bi2NiMnO6薄膜的导电机制.%Bi2 NiMnO6 ( abbreviated as BNMO ) thin films grow on LaNiO3 buffered Si ( 100 ) substrate prepared by chemical solution deposition.The structure of the thin films is characterized by X-ray diffrac-tion,and both the ferroelectric properties and leakage current behavior are measured by ferroelectric test-er at room temperature.The results suggest that they have become crystalline phases in the two samples annealed in N2 and O2 respectively.The ferroelectric properties appear in all samples under room temper-ature and the BNMO sample shows a fairly low leakage current density.Furthermore,the mechanism of electrical conductivity is also investigated in the paper.