磁控溅射法制备 Zn1－xFexO 薄膜的微结构及铁磁性研究∗

摘要

Zn1 -x Fex O (x =1.0%,3.0%,5.0%)thin films deposited on Si were successfully prepared by radio frequency magnetron sputtering.The microstructure,chemical composition,valence states,morphology and ferromagnetism of the films had been investigated by X-ray diffraction (XRD),X-ray photoelectron spectrosco-py (XPS),scanning electronic microscopy (SEM)and vibrating sample magnetometer (VSM),respectively. The results indicate that highly c -axis preferential orientation of Zn1 -x Fex O films with wurtzite phase was suc-cessfully fabricated by Fe doping.Valence state of Fe in Zn1 -x Fex O films was a mixture of 2+ and 3+.The re-sults of VSM experiment proved the ferromagnetism of Zn1 -x Fex O at room temperature.The sources of ferro-magnetic are attributed to magnetic polaron induced by the magnetic ions and the vacancy defects.%采用射频磁控溅射法在 Si 衬底上制备了Zn1－x Fex O (x ＝1．0％,3．0％,5．0％)薄膜样品,并利用 X 射线衍射(XRD)、扫描电子显微(SEM)、X 射线光电子能谱(XPS)对其微结构、表面形貌和化学成分及价态进行分析,结果表明,Zn1－x Fex O (x ＝1．0％,3．0％,5．0％)薄膜晶体结构为 c 轴择优生长的六角纤锌矿结构,Fe 在晶体中以二价和三价两种价态存在.利用振动样品强磁计(VSM)对样品的铁磁性进行测试,薄膜样品在室温下具有明显的铁磁性,并经分析认为铁磁性来源可能是磁性离子与空位缺陷形成束缚磁极子引起的结果.