适用于小型生产线运行的单晶圆清洗技术的实现

摘要

The use of a single-wafer spin cleaning process using ozonated water and dilute hydrogen fluoride accommodates a manufacturer's shift to minifab operations, where shorter cycle times are possible.%利用臭氧消毒水和淡氟氢酸清洗技术,使设备生产厂家的单晶圆旋转清洗工艺适应向小型生产线转入的应用,从而使生产周期的缩短成为可能.