首页> 外文会议>5th International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS), 5th, Sep 18-20, 2000, Ostend, Belgium >Application of Megasonic Single Wafer Cleaning Technology to LSI Mass Production Line
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Application of Megasonic Single Wafer Cleaning Technology to LSI Mass Production Line

机译:Megasonic单晶圆清洗技术在LSI大规模生产线中的应用

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摘要

We obtained the followings in conclusion. (1) Megasonic system have wide variations on the megasonic output power among equipments (2) Megasonic power adjustment among equipments is essential for mass production use. (3) Damage measurement using photoresist coated wafer is practical method for daily QC. (4) Stabilized power supply system shows good performance on both damages and removal rate.
机译:我们得出以下结论。 (1)Megasonic系统的设备之间的Megasonic输出功率差异很大(2)设备之间的Megasonic功率调节对于批量生产至关重要。 (3)使用涂有光刻胶的晶圆进行损伤测量是日常质量控制的实用方法。 (4)稳定的电源系统在损坏和清除率上均表现出良好的性能。

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