三角形单晶硅支撑梁结构超薄X射线氮化硅窗口的制备

摘要

In this paper, the fabrication of the 35μm width triangle monocrystalline silicon support fine grid silicon nitride X-ray window was demonstrated. With 19.3% area of silicon support grid and about 50 nm thick silicon nitride film, the window has the ability to tolerate an atmospheric pressure difference. Compared to MEMS X-ray window in the past, this structure has more simple, reliable and low-cost manufacturing processes, which could be applied to X-ray fluorescence analyzer and SEM energy dispersive spectrum analyzer.%研究并实现了一种35μm宽三角形硅支撑梁X射线氮化硅膜窗口，通过对位于单晶硅片中央的氮化硅薄膜窗口进行测试，并获得了较好的性能参数：硅支撑梁部分所占面积为19.3%，氮化硅膜厚度约为50 nm，并且能够耐受一个大气压强差。本论文提出的结构与以往的MEMS工艺制备的X射线窗口相比较，更加简单、可靠，并且制备成本更低，可适用于X射线荧光分析仪和SEM的能量色散谱分析仪等设备的X射线引出窗口。