热处理温度对钼靶材微观组织和性能的影响

摘要

通过定量金相技术和显微硬度测试等方法，研究了热处理温度对钼溅射靶材的微观组织、硬度及I-U曲线的影响规律。研究结果表明，钼靶材晶粒尺寸随着热处理温度的升高而增大，而靶材硬度随之呈下降趋势。钼靶材在1200℃进行1 h热处理，晶粒尺寸分布最均匀。所研究钼靶材的I-U曲线均符合Thornton经验公式，热处理温度为1200℃的靶材具有最佳的磁控溅射放电性能。%The effects of annealing temperature on microstructure, hardness and I-U curve of Mo sputtering targets were studied by means of quantitative metallographic techniques and hardness test. The results show that the grain size of Mo targets increases with increasing annealing temperature, as well as hardness of targets declined. The Mo target with annealing process of 1 200 ℃ for 1 hour has the most uniform organization. All the targets’ I-U curves are in line with the Thornton experiential formula, and the Mo target annealed in 1 200 ℃ has the best magnetron sputtering discharge performance.