采用直流溅射法制备了高性能的ITO薄膜.结果表明,氧气分压比和衬底温度对薄膜的方阻、可见光透射率具有重要的影响.其最佳值分别为0.5/50和350℃;同时,随着膜厚的增加,薄膜的晶粒增大,导电率也相应降低.%The high quality ITO films were prepared by different temperature by DC magnetron sputtering. The result show that oxygen partial pressure and substrate have an important influence on the transmission in visible range and sheet resistivity. The optimal oxygen partial pressure is 0. 5/50, while the optimal substrate temperature is 350 ℃. The film conductivity is improved by increasing the film thickness and the size of film particle.
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