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Elastic strain reduction of finite germanium(x) silicon(1-x)/silicon structures.

机译:有限锗(x)硅(1-x)/硅结构的弹性应变降低。

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摘要

The focus of this dissertation is a rigorous examination the elastic, intrinsic behavior of stress/strain for epitaxial Si1−xGe x/Si (100) structures having finite dimensions. Existing models predict that the behavior is governed primarily by geometry, which can have a profound effect should the ratio of half-width to height (l/h) be less than 50. Two main aspects of existing theories were pressed: first, the role of geometry for a fixed Si1−xGex composition and therefore strain (ϵ = 0.42%) and second, the role of misfit stress for a fixed l/b ratio of 0.5. Strict control of the fabrication process necessitated selective epitaxial growth via gas-source molecular beam epitaxy. Though experimental combinations of various thickness (50, 100, 140, and 200 nm) and variable pitch (0.09–25 μm) a wide range of l/b values was obtained (0.5–500). As the selectively grown structures are arranged into a periodic array, where the period is repeated over a large distance (mm), in addition to dynamical diffraction, Fraunhoffer diffraction was also observed. These two complementary mechanisms of diffraction were used to determine the stress distribution within these structures. Ensemble with transmission electron microscopy, a qualitative assessment of elastic strain reduction mechanisms—local curvature effects and tangential forces—was possible. The main conclusions of this dissertation are as follows: (A) An analytical reciprocal space construction was developed to facilitate the interpretation of experimental x-ray diffraction data. (B) As a corollary, arbitrary positioning and movement in reciprocal space are described, which in practice is applied to capturing scattered intensity parallel to the surface. (C) Facet growth in SiGe selective epitaxy was investigated. One key result is the persistence of a {lcub}113{rcub} facet with increasing thickness, as the {lcub}111{rcub} facet is anticipated. (D) In examining the role of geometry, elastic lattice distortions were only observed for l/ b ratios 1.25, 0.8, and 0.5. Experimentally, a strong dependence of applied stress was observed. Overall, these results strongly deviate from the predictions, which brings to light the limitations of the models—namely, the role of tangential forces for single crystal films and the role of curvature.
机译:本文的重点是对具有有限尺寸的外延Si 1-x Ge x / Si(100)结构的应力/应变的弹性,固有行为进行严格研究。现有模型预测,行为主要受几何控制,如果半高与宽之比(l / h)小于50,则会产生深远的影响。按下现有理论的两个主要方面:第一,作用Si 1-x Ge x 的几何形状,因此应变(ϵ = 0.42%),其次是固定的失配应力的作用l / b 比率为0.5。严格控制制造过程需要通过气体源分子束外延进行选择性外延生长。尽管各种厚度(50、100、140和200 nm)和可变节距(0.09–25μm)的实验组合都获得了宽范围的 l / b 值(0.5–500)。当选择性生长的结构排列成周期性阵列时,该周期在大距离(mm)上重复,除了动态衍射外,还观察到Fraunhoffer衍射。衍射的这两个互补机制用于确定这些结构内的应力分布。与透射电子显微镜相结合,可以对弹性应变降低机制(局部曲率效应和切向力)进行定性评估。本论文的主要结论如下:(A)开发了一种分析互易空间构造,以方便解释实验X射线衍射数据。 (B)作为推论,描述了在互易空间中的任意定位和运动,在实践中将其应用于捕获平行于表面的散射强度。 (C)研究了SiGe选择性外延中的Facet生长。一个关键的结果是{lcub} 113 {rcub}刻面的厚度会不断增加,这是因为预计会出现{lcub} 111 {rcub}刻面。 (D)在检查几何的作用时,仅在1.25、0.8和0.5的 l / b 比率下观察到弹性晶格变形。在实验中,观察到施加应力的强烈依赖性。总体而言,这些结果大大偏离了预测,从而揭示了模型的局限性,即单晶膜的切向力的作用和曲率的作用。

著录项

  • 作者

    U'Ren, Gregory David.;

  • 作者单位

    University of California, Los Angeles.;

  • 授予单位 University of California, Los Angeles.;
  • 学科 Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2000
  • 页码 93 p.
  • 总页数 93
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

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