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Theoretical studies of H-passivated silicon nanowires, silicon surface systems and silicon/germanium core/shell nanowires.

机译:H钝化硅纳米线,硅表面系统和硅/锗核/壳纳米线的理论研究。

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摘要

Global structural optimization with Genetic Algorithm and first principle analysis have been performed on the Silicon nanowires, Ag induced Si surface reconstruction systems and Si/Ge core/shell nanowires. By using genetic algorithm combined with ab-initio calculation, we determined the atomic structures H-passivated 110> and 112> silicon nanowires. We found that at certain values of the hydrogen chemical potential the nanowires can take relatively stable structures in 112> SiNWs with rectangular cross sections bounded by monohydride {110} and {111} facets with dihydride wire edges. In 110> SiNWs cross section of the nanowire evolves from chains of six-atom rings to fused pairs of such chains to hexagons bounded by {001} and {111} facets. Second, with the structural models of SiNWs, we further analyzed their electronic properties. We showed that the 112> SiNWs have an indirect to quasi-direct band gap transition with the increasing sizes and the band gap properties under uniaxial stress and different aspect ratios. Third, we did a Ag-induced Si(111) (rt3xrt3) and (3x1) surface reconstruction search with our variablenumber GA with ab-initio relaxation. The (rt3xrt3) global search found the Inequivalent Triangle (IET) structure as the lowest energy. A model of combination of pure Ag films and IET structure is proposed to explain the islands-to-holes ratio (RIH) equals 3 situation observed in experiments. For the (3x1) reconstruction, a model with 2/3 ML Ag and 1Ml Si coverage has been found and it has lower surface energy than the widely accepted HCC model with only 1/3 ML Ag coverage. Finally, we did some DFT calculation on the Si/Ge and Ge/Si core/shell [112] nanowires. The charged localization inside the NWs reveals that the electrons and holes are seperated. The quantum confinement effect in the NWs is strongly modified by the band offsets. An indirect to quasi-direct band gap transition can be obtained with a compressive strain, and the depth of the quantum wells can be modulated by the aspect ratios.
机译:使用遗传算法和第一原理分析对硅纳米线,银诱导的硅表面重建系统和硅/锗核/壳纳米线进行了全局结构优化。通过使用遗传算法结合从头计算,我们确定了H钝化的<110>和<112>硅纳米线的原子结构。我们发现,在一定的氢化学势值下,纳米线可以在<112> SiNWs中采用相对稳定的结构,其矩形截面由带有二氢化物线边缘的一氢化物{110}和{111}面界定。在<110> SiNWs中,纳米线的截面从六原子环的链演变成这种链的融合对,再到以{001}和{111}面为界的六边形。其次,利用SiNW的结构模型,我们进一步分析了它们的电子特性。我们显示,<112> SiNWs在单轴应力和不同长宽比下具有随着尺寸和带隙性质的增加而间接转变为准直接带隙的过程。第三,我们使用具有从头开始弛豫的变量GA进行了Ag诱导的Si(111)(rt3xrt3)和(3x1)表面重建搜索。 (rt3xrt3)全局搜索发现不等价三角形(IET)结构是最低的能量。提出了纯银膜与IET结构结合的模型,以解释在实验中观察到的岛孔比(RIH)等于3的情况。对于(3x1)重建,已发现具有2/3 ML Ag和1Ml Si覆盖率的模型,并且其表面能比被广泛接受的仅1/3 ML Ag覆盖率的HCC模型低。最后,我们对Si / Ge和Ge / Si核/壳[112]纳米线进行了DFT计算。 NW内部的带电局域表明电子和空穴是分开的。 NW中的量子约束效应被带隙强烈地改变了。可以通过压缩应变获得间接到准直接的带隙跃迁,并且可以通过纵横比来调节量子阱的深度。

著录项

  • 作者

    Lu, Ning.;

  • 作者单位

    Iowa State University.;

  • 授予单位 Iowa State University.;
  • 学科 Physics General.;Engineering Materials Science.;Nanotechnology.
  • 学位 Ph.D.
  • 年度 2010
  • 页码 113 p.
  • 总页数 113
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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