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Growth and Optical Characterization of Zinc Oxide Nanowires for Anti-Reflection Coatings for Solar Cells.

机译:用于太阳能电池的抗反射涂层的氧化锌纳米线的生长和光学特性。

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摘要

The optical properties of solar cells greatly affect their efficiencies. Decreasing the broadband and directional reflectance of solar cells increases the solar irradiance transmitted and absorbed by the cell, thereby increasing the production of electron-hole pairs. Traditional optical enhancements such as light trapping and anti-reflection coatings reduce the reflectance of silicon at an optimized wavelength and angle of incidence. They do not perform as well at high angles of incidence or over the broadband solar spectrum. Theoretical studies suggest that layers with a suitable gradient-index of refraction can create both a broadband and directional anti-reflective coating. Through their variations in height and tapered growth, Zinc oxide (ZnO) nanowires can create a gradient index anti-reflection coating. ZnO is a wide-band gap semiconductor that is non-absorbing over most of the solar spectrum. With low cost, low temperature techniques, ZnO nanowires can be grown with a variety of morphologies.;ZnO nanowires were grown by aqueous chemical growth and by electrodeposition on silicon to create a gradient-index anti-reflective coating for solar cell applications. The nanowire arrays were characterized using SEM images, goniometer scattering measurements, and integrating sphere total reflectance measurements. ZnO nanowires grown by aqueous chemical growth on silicon had average diameters between 60 nm and 100 nm and average lengths between 800 nm and 1100 nm. The nanowires had vertical alignment. They exhibited relatively small diffuse reflectivities and relatively large specular reflectivities. ZnO nanowires grown by electrodeposition had greater variances in length and diameter, with average diameters between 85 nm and 180 nm and average lengths between 500 nm and 1200 nm. Electrodeposited ZnO nanowires were randomly arrayed and exhibited relatively large diffuse reflectivities and relatively small specular reflectivities. Total reflectance measurements showed that all nanowire arrays reduced the broadband reflectance of silicon. Smaller nanowire arrays outperformed the larger crystal growths. A five-fold decrease in the broadband reflectance of silicon was obtained from both vertical and randomly oriented nanowire arrays. The reflectances were constant for angles of incident below 35°. Measurements at angles of incidence greater than 35° are required to determine whether ZnO nanowires can perform as directional anti-reflective coatings and whether the morphology of the nanowires affects the directional reflectances.
机译:太阳能电池的光学特性极大地影响了它们的效率。降低太阳能电池的宽带反射率和方向反射率会增加太阳能电池透射和吸收的太阳辐照度,从而增加电子-空穴对的产生。传统的光学增强技术(例如,光捕获和抗反射涂层)会降低硅在最佳波长和入射角下的反射率。它们在高入射角或宽带太阳光谱上的性能不佳。理论研究表明,具有适当梯度折射率的层可以同时形成宽带和定向抗反射涂层。氧化锌(ZnO)纳米线通过高度和锥形生长的变化,可以创建梯度折射率减反射涂层。 ZnO是一种宽带隙半导体,在大多数太阳光谱中均不吸收。利用低成本,低温技术,可以生长出具有多种形态的ZnO纳米线。ZnO纳米线是通过水性化学生长和通过在硅上电沉积而生长的,以创建用于太阳能电池应用的梯度折射率抗反射涂层。使用SEM图像,测角仪散射测量和积分球全反射率测量来表征纳米线阵列。通过在硅上进行水化学生长而生长的ZnO纳米线的平均直径在60nm至100nm之间,并且平均长度在800nm至1100nm之间。纳米线具有垂直排列。它们表现出相对较小的漫反射率和相对较大的镜面反射率。通过电沉积生长的ZnO纳米线的长度和直径变化更大,平均直径在85 nm至180 nm之间,平均长度在500 nm至1200 nm之间。电沉积的ZnO纳米线随机排列,并表现出较大的漫反射率和较小的镜面反射率。全反射率测量表明,所有纳米线阵列均降低了硅的宽带反射率。较小的纳米线阵列胜过较大的晶体生长。从垂直和随机取向的纳米线阵列获得的硅的宽带反射率降低了五倍。对于低于35°的入射角,反射率是恒定的。需要确定入射角大于35°的值才能确定ZnO纳米线是否可以用作定向抗反射涂层,以及纳米线的形态是否会影响定向反射率。

著录项

  • 作者

    Coakley, Martha.;

  • 作者单位

    Portland State University.;

  • 授予单位 Portland State University.;
  • 学科 Nanoscience.;Physics Optics.;Nanotechnology.
  • 学位 M.S.
  • 年度 2011
  • 页码 96 p.
  • 总页数 96
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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