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Timing analysis of CMOS logic gates in deep submicron VLSI design.

机译:深亚微米VLSI设计中CMOS逻辑门的时序分析。

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摘要

A comprehensive timing analysis of complementary metal-oxide semiconductor (CMOS) logic gates in deep submicron very large scale integration (VLSI) design is carried out. A computationally simple proper deep submicron MOSFET model (PDSMM) is proposed to accurately describe the static I--V characteristics of both long channel and deep submicron metal-oxide semiconductor field effect transistors (MOSFETs). The PDSMM is an extension of Shockley MOSFET model and Shichman-Hodges MOSFET model by incorporating the second-order effects of deep submicron MOSFETs such as charge carrier velocity saturation and channel length modulation. Using the PDSMM we develop propagation delay models for a deep submicron CMOS inverter. The effects of input transition time, gate-to-drain coupling capacitance, parasitic drain diffusion capacitance, and external load capacitance are taken into account. Even in the extreme conditions, the proposed propagation delay model of a deep submicron CMOS inverter can accurately duplicate the propagation delays from SPICE BSIM3.; In order to extend the propagation delay methodologies for a deep submicron CMOS inverter to model single-stage complex CMOS logic gates such as NAND or NOR gate, a generic series-connected MOSFET chain model (SMCM) is proposed to accurately depict the peculiar static I--V characteristics of a series-connected MOSFET chain with an equal input pattern. The effect of initial states of parasitic capacitances of intermediate nodes of a series-connected MOSFET chain is taken into account by using a modified input suppression technique associated with activation time. We focus on fast initial state (FIS) and slow initial state (SIS), which are the most useful in practice. Using the SMCM and the modified input suppression technique we develop propagation delay models for a single-stage complex CMOS logic gate. We propose a simple input mapping technique to investigate the effect of arbitrary input pattern of a single-stage complex CMOS logic gate. These timing models include initial states of parasitic capacitances and arbitrary input pattern in addition to the factors used in propagation delay models of a CMOS inverter. The comprehensive propagation delay models of a single-stage complex CMOS logic gate can accurately reproduce the propagation delays from SPICE BSIM3.; The proposed comprehensive propagation delay models are suitable to precisely describe transition behaviors of deep submicron CMOS logic gates. They can be exploited in electronic design automation (EDA) flows to implement, verify and optimize deep submicron CMOS VLSI designs.
机译:在深亚微米超大规模集成电路(VLSI)设计中对互补金属氧化物半导体(CMOS)逻辑门进行了全面的时序分析。提出了一种计算简单的适当的深亚微米MOSFET模型(PDSMM),以准确描述长沟道和深亚微米金属氧化物半导体场效应晶体管(MOSFET)的静态IV特性。 PDSMM是Shockley MOSFET模型和Shichman-Hodges MOSFET模型的扩展,它结合了深亚微米MOSFET的二阶效应,例如载流子速度饱和和沟道长度调制。使用PDSMM,我们为深亚微米CMOS反相器开发了传播延迟模型。考虑了输入过渡时间,栅漏耦合电容,寄生漏极扩散电容和外部负载电容的影响。即使在极端条件下,所提出的深亚微米CMOS反相器的传播延迟模型也可以精确地复制SPICE BSIM3的传播延迟。为了扩展深亚微米CMOS反相器的传播延迟方法,以对诸如NAND或NOR门之类的单级复杂CMOS逻辑门进行建模,提出了一种通用的串联MOSFET链模型(SMCM)来准确描述特殊的静态I具有相同输入模式的串联MOSFET链的--V特性。通过使用与激活时间相关的改进的输入抑制技术,可以考虑串联连接的MOSFET链的中间节点的寄生电容的初始状态的影响。我们专注于快速初始状态(FIS)和慢速初始状态(SIS),它们在实践中最有用。使用SMCM和改进的输入抑制技术,我们为单级复杂CMOS逻辑门开发了传播延迟模型。我们提出了一种简单的输入映射技术,以研究单级复杂CMOS逻辑门的任意输入模式的影响。除了在CMOS反相器的传播延迟模型中使用的因素之外,这些时序模型还包括寄生电容的初始状态和任意输入模式。单级复杂CMOS逻辑门的综合传播延迟模型可以准确地从SPICE BSIM3再现传播延迟。所提出的综合传播延迟模型适用于精确描述深亚微米CMOS逻辑门的跃迁行为。可以在电子设计自动化(EDA)流程中利用它们来实施,验证和优化深亚微米CMOS VLSI设计。

著录项

  • 作者

    Jiang, Xueping.;

  • 作者单位

    Colorado State University.;

  • 授予单位 Colorado State University.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2005
  • 页码 327 p.
  • 总页数 327
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

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