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High-performance 1.55-uM gallium indium nitride arsenide antimonide lasers grown on gallium arsenide.

机译:在砷化镓上生长的高性能1.55-uM氮化铟镓砷化镓锑激光器。

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摘要

Next-generation local and metro-area optical networks require high-performance lasers, detectors, and modulators operating at 1.55 mum. In contrast to long-haul networks, components must be very inexpensive, power efficient, and producible in high volumes---all with little sacrifice to performance. Two classes of lasers are required. The first is low-power (∼1-10 mW) 1.55-mum communication sources, such as vertical-cavity surface-emitting lasers (VCSELs), that must be insensitive to ambient temperature and operable at high modulation rates. The second class is higher output power (∼300 mW) lasers emitting at shorter wavelengths (∼1.48 mum) for pumping Raman and doped fiber amplifiers.; This work describes the development of a novel GaAs-based gain material, GaInNAsSb, which is ideal for both classes of lasers. Materials growth via molecular beam epitaxy is challenging, but optical quality can be improved dramatically through the introduction of antimony and other enhancements that are discussed. We demonstrate the first low-threshold GaAs-based lasers from 1.45-1.55 mum and the first GaAs-based QW laser >1.6 mum. Laser threshold current densities are as low as 440 A/cm2---comparable, if not superior, to commercially available InP-based devices. High continuous-wave output powers ∼400 mW, more than sufficient for amplifier applications, are achieved from even simple single quantum well structures. Laser results at 1.55 mum validate this new materials system for use in VCSEL sources as well. The temperature stability of these devices, the relevant physics, and methods for improvement are also discussed.
机译:下一代局域和城域光网络需要以1.55微米工作的高性能激光器,检测器和调制器。与远程网络相比,组件必须非常便宜,省电且可大量生产,而这些都不会牺牲性能。需要两类激光器。第一个是低功率(〜1-10 mW)1.55微米通信源,例如垂直腔表面发射激光器(VCSEL),它们必须对环境温度不敏感并且可以在高调制速率下工作。第二类是较高输出功率(约300 mW)的激光器,其发射的波长较短(约1.48 mum),用于泵浦拉曼和掺杂光纤放大器。这项工作描述了一种新型的基于GaAs的增益材料GaInNAsSb的开发,该材料非常适合这两类激光器。通过分子束外延生长材料具有挑战性,但是通过引入锑和讨论的其他增强技术,可以极大地提高光学质量。我们演示了从1.45-1.55微米的第一批低阈值基于GaAs的激光器和第一批> 1.6微米的基于GaAs的QW激光器。激光阈值电流密度低至440 A / cm2--与市售的InP基器件相比甚至更高。即使是简单的单量子阱结构,也能获得约400 mW的高连续波输出功率,足以满足放大器的应用需求。 1.55毫米的激光结果也证明了该新材料系统也可用于VCSEL光源。还讨论了这些设备的温度稳定性,相关物理原理和改进方法。

著录项

  • 作者

    Bank, Seth Robert.;

  • 作者单位

    Stanford University.;

  • 授予单位 Stanford University.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2006
  • 页码 157 p.
  • 总页数 157
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

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