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Mechanical stress effects on the electrical characteristics of III-nitride devices.

机译:机械应力对III族氮化物器件的电气特性的影响。

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摘要

Hydrostatic pressure and uniaxial stress have long been used to study the properties of semiconductors. The changes in the properties of semiconductors with stress have contributed vitally to the understanding of semiconductors at atmospheric conditions. The strong piezoelectricity of III-nitrides has important implications for device characteristics. Furthermore, it can be exploited in designing stress sensors, particularly devices that can operate at high temperature and in harsh environments. This thesis presents a study of mechanical stress effects on the electrical characteristics of several III-nitride devices, and it explores their potential as stress sensors.; The electrical conductivity of a p-GaN epitaxial layer is measured as a function of uniaxial stress and as a function of hydrostatic pressure. The observed piezoconductivity is consistent with theoretical calculations based on stress induced changes in the band structure near the top of the valence band.; Uniaxial stress and hydrostatic pressure are applied to Ni Schottky contacts on Ga-polarity n-GaN, N-polarity n-GaN, and Ga-polarity n-AlGaN. The changes in barrier heights with stress are attributed to a combination of band structure and piezoelectric effects.; Hydrostatic pressure is applied to AlGaN/GaN heterojunction field effect transistors (HFETs). The drain current is found to increase with pressure owing to a negative shift of threshold voltage. The pressure effect is attributed to an increase of the polarization charges at the AlGaN/GaN interface as well as a shift of the gate contact Schottky barrier height.; The effect of hydrostatic pressure on the current-voltage characteristics of GaN/AlGaN/GaN heterostructure devices is examined. Theoretical modeling suggests a decrease of the current with pressure due to the piezoelectric effect. The concept is verified experimentally by examining a GaN/Al 0.2Ga0.8N/GaN device under hydrostatic pressure. The current is found to decrease approximately linearly with pressure in agreement with the model results.; The thesis demonstrates the importance of piezoelectricity in III-nitride device characteristics, and their considerable potential as stress sensors. Of all the devices tested under hydrostatic pressure, Ga-polarity n-AlGaN Schottky diodes have the largest gauge factor at room temperature, while AlGaN/GaN HFETs appear to have the advantage of good thermal stability and suitability for high temperature operation.
机译:长期以来,静水压力和单轴应力一直用于研究半导体的性能。带有应力的半导体特性的变化对理解大气条件下的半导体起了至关重要的作用。 III族氮化物的强压电性对器件特性具有重要意义。此外,可以在设计应力传感器,特别是可以在高温和恶劣环境下运行的设备的设计中加以利用。本文研究了机械应力对几种III族氮化物器件电学特性的影响,并探讨了其作为应力传感器的潜力。测量p-GaN外延层的电导率作为单轴应力的函数和静水压力的函数。所观察到的压电性与基于应力在价带顶部附近的能带结构中的变化引起的理论计算是一致的。将单轴应力和静水压力施加到Ga极性n-GaN,N极性n-GaN和Ga极性n-AlGaN上的Ni肖特基接触。势垒高度随应力的变化归因于能带结构和压电效应的结合。将静水压力施加到AlGaN / GaN异质结场效应晶体管(HFET)。由于阈值电压的负移,发现漏极电流随压力增加。压力效应归因于AlGaN / GaN界面处极化电荷的增加以及栅极接触肖特基势垒高度的移动。研究了静水压力对GaN / AlGaN / GaN异质结构器件电流-电压特性的影响。理论模型表明,由于压电效应,电流随压力降低。通过在静水压力下检查GaN / Al 0.2Ga0.8N / GaN器件,对该概念进行了实验验证。发现电流与压力近似线性降低,与模型结果一致。本文证明了压电在III型氮化物器件特性中的重要性及其作为应力传感器的巨大潜力。在静水压力下测试的所有器件中,Ga极性n-AlGaN肖特基二极管在室温下具有最大的规格系数,而AlGaN / GaN HFET似乎具有良好的热稳定性和适用于高温操作的优势。

著录项

  • 作者

    Liu, Yuming.;

  • 作者单位

    University of Minnesota.;

  • 授予单位 University of Minnesota.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2006
  • 页码 100 p.
  • 总页数 100
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

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