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Interference lithography for optical devices and coatings.

机译:光学设备和涂层的干涉光刻。

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摘要

Interference lithography can create large-area, defect-free nanostructures with unique optical properties. In this thesis, interference lithography will be utilized to create photonic crystals for functional devices or coatings. For instance, typical lithographic processing techniques were used to create 1, 2 and 3 dimensional photonic crystals in SU8 photoresist. These structures were in-filled with birefringent liquid crystal to make active devices, and the orientation of the liquid crystal directors within the SU8 matrix was studied.;Most of this thesis will be focused on utilizing polymerization induced phase separation as a single-step method for fabrication by interference lithography. For example, layered polymer/nanoparticle composites have been created through the one-step two-beam interference lithographic exposure of a dispersion of 25 and 50 nm silica particles within a photopolymerizable mixture at a wavelength of 532 nm. In the areas of constructive interference, the monomer begins to polymerize via a free-radical process and concurrently the nanoparticles move into the regions of destructive interference. The holographic exposure of the particles within the monomer resin offers a single-step method to anisotropically structure the nanoconstituents within a composite.;A one-step holographic exposure was also used to fabricate self-healing coatings that use water from the environment to catalyze polymerization. Polymerization induced phase separation was used to sequester an isocyanate monomer within an acrylate matrix. Due to the periodic modulation of the index of refraction between the monomer and polymer, the coating can reflect a desired wavelength, allowing for tunable coloration. When the coating is scratched, polymerization of the liquid isocyanate is catalyzed by moisture in air; if the indices of the two polymers are matched, the coatings turn transparent after healing. Interference lithography offers a method of creating multifunctional self-healing coatings that readout when damage has occurred.
机译:干涉光刻可以创建具有独特光学特性的大面积,无缺陷的纳米结构。在本文中,将利用干涉光刻技术来制造用于功能器件或涂层的光子晶体。例如,典型的光刻处理技术用于在SU8光致抗蚀剂中创建1维,2维和3维光子晶体。这些结构中填充了双折射液晶以制成有源器件,并研究了SU8基质中液晶指向矢的取向。;本论文的大部分内容将集中于利用聚合诱导的相分离作为一步法通过干涉光刻制造。例如,通过在光可聚合混合物中以波长532 nm对25和50 nm二氧化硅颗粒的分散体进行一步一步两束干涉光刻曝光,可以形成层状聚合物/纳米颗粒复合材料。在相长干涉的区域中,单体通过自由基过程开始聚合,并且同时纳米颗粒进入相长干涉的区域。单体树脂中颗粒的全息曝光提供了一种单步方法来各向异性地形成复合材料中的纳米成分。;一步全息曝光还用于制造自修复涂料,该涂料利用环境中的水催化聚合。聚合诱导的相分离用于将异氰酸酯单体隔离在丙烯酸酯基体内。由于单体和聚合物之间的折射率的周期性调节,涂层可以反射所需的波长,从而可调节颜色。刮擦涂层时,空气中的水分会催化液态异氰酸酯的聚合;如果两种聚合物的折射率匹配,则涂层在愈合后变为透明。干涉光刻技术提供了一种创建多功能自修复涂层的方法,该涂层可以在发生损坏时读出。

著录项

  • 作者

    Juhl, Abigail Therese.;

  • 作者单位

    University of Illinois at Urbana-Champaign.;

  • 授予单位 University of Illinois at Urbana-Champaign.;
  • 学科 Nanotechnology.;Engineering Materials Science.;Physics Optics.
  • 学位 Ph.D.
  • 年度 2010
  • 页码 124 p.
  • 总页数 124
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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