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Electrical Properties of Zn(Mn,Co)O films grown by Pulsed Laser Deposition Method

机译:脉冲激光沉积法生长Zn(Mn,Co)O薄膜的电学性质

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High quality ZnO films were made by using a pulsed laser deposition (PLD) system. Through a same method magnetic element doped Zn(Mn,Co)O films were grown. An XRD measurement was tried and the result showed a single crystal of wurtzite structure. A capacitance-voltage measurement showed that the ZnMnO has electrical properties of an n-type semiconductor, and carrier concentration is 5 × 10~(18) cm~(-3). From a deep level transient spectroscopy (DLTS) measurement, an oxygen vacancy and a Mn-related electron trap in the ZnMnO film were appeared as E_c-0.62 eV and E_c-0.13 eV, respectively. The electrical measurement of the ZnCoO films showed meaningless results because of its high conductance.
机译:通过使用脉冲激光沉积(PLD)系统制成高质量的ZnO薄膜。通过相同的方法,生长了掺杂磁性元素的Zn(Mn,Co)O薄膜。尝试了XRD测量,结果显示纤锌矿结构的单晶。电容电压测量表明,ZnMnO具有n型半导体的电学特性,载流子浓度为5×10〜(18)cm〜(-3)。根据深层瞬态光谱法(DLTS)的测量,ZnMnO膜中的氧空位和Mn相关的电子陷阱分别显示为E_c-0.62 eV和E_c-0.13 eV。 ZnCoO膜的电学测量显示出无意义的结果,因为它的电导率很高。

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