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Proximity-compensated kinoforms directly written by e-beam lithography

机译:通过电子束光刻直接编写的接近补偿的千分表

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摘要

Abstract: We report on direct-writing EBL manufactured, proximity compensated blazed transmission gratings. The proximity compensation is made using a non-linear iterative process in the spatial domain. The diffraction efficiency for a compensated 8 micron period grating was 84%, almost twice that of an uncompensated grating. !3
机译:摘要:我们报道了直接写入EBL制造的,接近补偿的闪耀透射光栅。使用空间域中的非线性迭代过程进行邻近补偿。补偿的8微米周期光栅的衍射效率为84%,几乎是未补偿光栅的两倍。 !3

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