首页> 外文会议>VLSI Circuits (VLSIC), 2012 Symposium on >1Mb 4T-2MTJ nonvolatile STT-RAM for embedded memories using 32b fine-grained power gating technique with 1.0ns/200ps wake-up/power-off times
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1Mb 4T-2MTJ nonvolatile STT-RAM for embedded memories using 32b fine-grained power gating technique with 1.0ns/200ps wake-up/power-off times

机译:1Mb 4T-2MTJ非易失性STT-RAM,用于嵌入式存储器,采用32b细粒度功率门控技术,具有1.0ns / 200ps的唤醒/断电时间

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摘要

A 1Mb nonvolatile STT-RAM using the 4T-2MTJ cell is designed and fabricated using 90nm CMOS and MTJ processes. 32 cells along a word line (WL) are simultaneously power-gated with quick wake-up/power-off times of 1.0ns/200ps, respectively, to reduce operation power and to eliminate standby power of the chip. The cell is experimentally shown to retain data with static noise margin (SNM) 0.32V under Vdd=1V. The 1Mb chip with 2.19µm2 cell is successfully operated with array access time of 8ns and read power of 10.7mW under 10ns cycle. The macro size of 1Mb STT-RAM is predicted to become smaller than the 1Mb 6T-SRAM in 45nm and beyond.
机译:使用90nm CMOS和MTJ工艺设计和制造了使用4T-2MTJ单元的1Mb非易失性STT-RAM。沿字线(WL)的32个单元分别以1.0ns / 200ps的快速唤醒/断电时间同时进行门控,以降低工作功耗并消除芯片的待机功耗。实验表明该单元可以在Vdd = 1V的情况下以0.32V的静态噪声容限(SNM)保留数据。具有2.19µm 2 单元的1Mb芯片在10ns周期内成功运行,阵列访问时间为8ns,读取功率为10.7mW。预计1Mb STT-RAM的宏大小将在45nm及以后变得小于1Mb 6T-SRAM。

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