首页> 外文会议>Symposium on Thin-Films - Stresses and Mechanical properties Vii, held December 1-5, 1997, Boston, Massachusetts, U.S.A. >Determination of the mechanical properties of polysilicon thin films using bulge testing
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Determination of the mechanical properties of polysilicon thin films using bulge testing

机译:使用凸起测试确定多晶硅薄膜的机械性能

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摘要

Using standard deposition and micromachining techniques, silicon substrates with square and rectangular windows covered with membranes of polycrystalline silicon (polysilicon) have been fabricated. Pressure-displacement curves obtained during the bulge testing of membranes with the above geometries have been used to determine the elastic constants E and v of the polysilicon. The results obtained (E=162+-4 GPa and v=0.19 +- 0.03) are in good agreement with literature values for bulk polycrystalline silicon.
机译:使用标准的沉积和微加工技术,已经制造出具有覆盖有多晶硅膜的正方形和矩形窗口的硅衬底。在具有上述几何形状的膜的凸起测试期间获得的压力-位移曲线已用于确定多晶硅的弹性常数E和v。获得的结果(E = 162 + -4 GPa和v = 0.19 +-0.03)与块状多晶硅的文献数据非常吻合。

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