【24h】

MBE growth and thermoelectric properties of Bi_2Te_3 thin films

机译:Bi_2Te_3薄膜的MBE生长和热电性能

获取原文
获取原文并翻译 | 示例

摘要

we have grown thigh quality Bi-2Te_3 thin films on CdTe(111)B substrates using MBE. Structural poperties have been investigated using in-situ reflection high-energy electron diffraction (RHEED) and theta 2 theta X-ray diffraction analysis. They show that Bi_2Te_3 films on CdTe(111) grow along the (00.l( in the hexagonal cell with a layer-by-layer growth mode, resulting in a smooth surface, and an X-ray Bragg peak FWHM of 0.2 deg . The thermopower and electrical conductivity of the stoichiometric Bi_2Te_3 films were approx 200 mu V/K and 10~e ( OMEGA cm)~(-1), respectively, comparable to the single crystal bulk values. We have observed the antisite defect effect in Te-rich Bi_2Te_3 films: excess Te occupies Bi lattice sites and behaves as an n-type dopant. Crystallinity and transport properties are strongly affected by non-stoichiometry.
机译:我们已经使用MBE在CdTe(111)B衬底上生长了大质量的Bi-2Te_3薄膜。结构原位已使用原位反射高能电子衍射(RHEED)和theta 2 theta X射线衍射分析进行了研究。他们显示CdTe(111)上的Bi_2Te_3薄膜沿(00.l()在六边形电池中以逐层生长模式生长,产生光滑的表面,并且X射线布拉格峰FWHM为0.2度。化学计量比的Bi_2Te_3薄膜的热功率和电导率分别约为200μV / K和10〜e(OMEGA cm)〜(-1),与单晶体积值相当,我们观察到Te的反位缺陷效应富含Bi_2Te_3的薄膜:过量的Te占据Bi晶格位点并表现为n型掺杂剂,结晶度和传输性能受非化学计量学的强烈影响。

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号