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Growth and thermoelectric transport properties of bismuth-based thin film and multilayer structures.

机译:铋基薄膜和多层结构的生长和热电传输特性。

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摘要

Bi/Sb superlattices with different superlattice periods were grown on CdTe(111)B substrates using MBE. No interfacial misfit dislocations were observed in the cross-sectional HRTEM images of the Bi and Sb layers over an area of 0.1 μm2. Even structures with sub-monolayer Sb thicknesses exhibited clear periodicity, confirmed by the existence of the XRD satellite peaks. The electronic structure of superlattices with almost the same average composition could be modified by changing the superlattice period. While long-period samples showed semimetallic behavior, a semimetal-semiconductor transition was observed at short periods. The cross-plane thermal conductivity was also different from the same average composition bulk random alloy. For a 50 Å Bi/50 Å Sb superlattice, it was a factor 2 lower than the literature value for the Bi0.5Sb0.5 bulk alloy, which we interpret as arising from an increase in phonon scattering from the superlattice interfaces.; The anisotropy of Bi and BiSb alloy was studied using films, tilted by 19° from the substrate normal, grown on (211)CdTe. In Seebeck and magneto-Seebeck coefficient measurements, we observed a strong in-plane anisotropy, suggesting that films grown with the (00.1) axis tilted from the substrate normal show better in-plane thermoelectric properties than the more typical (00.1) films. In order to obtain high quality Bi films, post annealing just below the melting point of Bi was performed. A 10 μm Bi film grown on CdTe and subsequently annealed showed a large magnetoresistance ratio, 2700 at 5 K and 5 T, compared with 340 for the unannealed sample. The large magnetoresistance ratio of annealed bismuth films can be ascribed to a higher mobility relative to that in unannealed samples.; The well known room temperature thermoelectric materials Bi2Te 3 and Sb2Te3 were studied. The most stoichiometric sample exhibited high crystallinity, high thermopower and high electron mobility, which may be understood as arising from antisite defects. In Bi1+xTe 1−x films, we found that the structural and electronic properties are affected by the compositional deviation from stoichiometric Bi1Te 1, due to structural disorder by the insertion/removal of the Bi-Bi sequences among the Te-Bi-Te-Bi-Te sequences. Thermopower measurements revealed that, as the composition changes from Te-rich to Bi-rich, the thermopower varies from n-type to p-type, but in a way which is not a simple function of the composition.
机译:使用MBE在CdTe(111)B衬底上生长具有不同超晶格周期的Bi / Sb超晶格。在0.1μm 2 的Bi和Sb层的HRTEM截面图中,没有观察到界面失配位错。甚至具有亚单层Sb厚度的结构也表现出明显的周期性,这由XRD卫星峰的存在所证实。可以通过改变超晶格周期来改变具有几乎相同平均组成的超晶格的电子结构。虽然长期样品显示出半金属行为,但在短时间内观察到半金属-半导体的转变。横断面热导率也与相同的平均组成的块状无规合金不同。对于50ÅBi / 50ÅSb超晶格,它比Bi 0.5 Sb 0.5 块状合金的文献值低2倍,我们认为这是由于来自超晶格界面的声子散射增加;使用在(211)CdTe上生长的,从基底法线倾斜19°的薄膜研究Bi和BiSb合金的各向异性。在塞贝克(Seebeck)和磁塞贝克(Magneto-Seebeck)系数测量中,我们观察到了很强的面内各向异性,表明与(00.1)轴相比,典型的(00.1)轴相对于基板法线倾斜的生长膜具有更好的面内热电特性。为了获得高质量的Bi膜,进行了刚好低于Bi的熔点的后退火。在CdTe上生长并随后退火的10μmBi膜显示出较大的磁阻比,在5 K和5 T下为2700,而未退火的样品为340。相对于未退火的样品,退火的铋膜的大磁阻比可以归因于较高的迁移率。研究了著名的室温热电材料Bi 2 Te 3 和Sb 2 Te 3 。最化学计量的样品表现出高结晶度,高热功率和高电子迁移率,这可以理解为由反位缺陷引起。在Bi 1 + x Te 1-x 薄膜中,我们发现结构和电子性能受化学计量比Bi 1 的成分偏差影响Te 1 ,由于在Te-Bi-Te-Bi-Te序列中插入/删除Bi-Bi序列而导致结构紊乱。热功率测量显示,随着组成从富Te变为富Bi,热功率从n型变为p型,但其方式并非组成的简单函数。

著录项

  • 作者

    Kim, Yunki.;

  • 作者单位

    Northwestern University.;

  • 授予单位 Northwestern University.;
  • 学科 Physics Condensed Matter.
  • 学位 Ph.D.
  • 年度 2001
  • 页码 188 p.
  • 总页数 188
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 O49;
  • 关键词

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