首页> 外国专利> FORMATION METHOD OF A GAPLESS SEMICONDUCTOR THIN FILM, CAPABLE OF FORMING A PBPDO2 THIN FILM HAVING A SUPERIOR THERMOELECTRICITY PROPERTY

FORMATION METHOD OF A GAPLESS SEMICONDUCTOR THIN FILM, CAPABLE OF FORMING A PBPDO2 THIN FILM HAVING A SUPERIOR THERMOELECTRICITY PROPERTY

机译:能够形成具有优异热电性能的PBPDO2薄膜的半导电性半导体薄膜的形成方法

摘要

PURPOSE: A formation method is provided to control the composition ratio of PbO by forming a PbPdO2 thin film in a vacuum container at oxygen atmosphere.;CONSTITUTION: A lead palladium oxide target is prepared(S100). The lead oxide powder is prepared. The palladium oxide powder is prepared. The lead oxide powder and the palladium oxide powder are mixed and are sintered. The lead palladium oxide target is installed in the vacuum container and a substrate is provided(S200). The lead palladium oxide thin film is formed on the substrate by using the lead palladium oxide target(S300).;COPYRIGHT KIPO 2011
机译:目的:提供一种形成方法,通过在氧气气氛下的真空容器中形成PbPdO2薄膜来控制PbO的组成比。;组成:制备氧化铅钯靶(S100)。制备氧化铅粉末。制备氧化钯粉末。将氧化铅粉末和氧化钯粉末混合并烧结。将氧化铅钯靶安装在真空容器中并提供衬底(S200)。使用氧化铅钯靶在基板上形成氧化钯钯薄膜(S300)。;COPYRIGHT KIPO 2011

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