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机译:离子照射诱导缺陷在Bi_2Te_3薄膜的热电传输性质中的作用
Indira Gandhi Ctr Atom Res Mat Sci Grp Kalpakkam 603102 India|HBNI Kalpakkam 603102 Tamil Nadu India;
Indira Gandhi Ctr Atom Res Mat Sci Grp Kalpakkam 603102 India|HBNI Kalpakkam 603102 Tamil Nadu India;
Indira Gandhi Ctr Atom Res Mat Sci Grp Kalpakkam 603102 India;
Inter Univ Accelerator Ctr Div Mat Sci Aruna Asaf Ali Marg New Delhi 110067 India;
Indira Gandhi Ctr Atom Res Mat Sci Grp Kalpakkam 603102 India|HBNI Kalpakkam 603102 Tamil Nadu India;
Indira Gandhi Ctr Atom Res Mat Sci Grp Kalpakkam 603102 India|HBNI Kalpakkam 603102 Tamil Nadu India;
Inter Univ Accelerator Ctr Div Mat Sci Aruna Asaf Ali Marg New Delhi 110067 India;
Bismuth telluride; Thin film; Ion irradiations; Defects; Thermoelectric;
机译:离子束辐照对Bi_2Te_3和Sb_2Te_3薄膜热电性能的影响
机译:通过在MBE-生长的BI_2TE_3薄膜中原位转化引起的厚度依赖电子传输
机译:二元Bi_2Te_3和Sb_2Te_3薄膜的室温MBE沉积,热电性质和先进的结构表征
机译:脉冲激光沉积制备Bi_2Te_3基薄膜的热电性能
机译:离子辐照钇钡氧化铜薄膜的传输和红外特性。
机译:更正:SinnarasaI。等。射频磁控溅射制备铜铁矿CuCrO2:Mg薄膜的热电和输运性质。纳米材料20177157
机译:薄膜内的平面传输和增强的热电性能 拓扑绝缘体Bi_2Te_3和Bi_2se_3