首页> 外文会议>Symposium on Self-Organized Processes in Semiconductor Alloys held November 29-December 2, 1999, Boston, Massachusetts, U.S.A. >Identification of shape transitions in coherent Ge/Si islands using transmission electron microscopy
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Identification of shape transitions in coherent Ge/Si islands using transmission electron microscopy

机译:使用透射电子显微镜鉴定相干Ge / Si岛中的形状转变

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As a consequence of strain relaxation, Ge coherent islands on Si(001) substrates evolve to different shapes as islands grow. By measuring the size and the strain simultaneously in a large population of individual islands using two simple and robust plan-view transmission electron microscopy-based techniques, we can identify island shapes easily because island shape is a function of strain. We briefly introduce the mechanisms of these two techniques. We then show that there is a metastable shape of Ge islands involved in the shape transition between pyramids and domes. The strain relaxation changes discontinuously as islands grow from pyramids to the metastable form and then finally to domes indicating that the shape transition between pyramids and domes is first order. We also show that the shape of this metastable island is a truncated dome and the faceted planes are {103}.
机译:由于应变松弛,Si(001)衬底上的Ge相干岛随着岛的增长而发展为不同的形状。通过使用两种简单且可靠的基于平面视图的透射电子显微镜技术,同时测量大量单个岛的大小和应变,我们可以轻松识别岛的形状,因为岛的形状是应变的函数。我们简要介绍这两种技术的机制。然后,我们证明在金字塔和穹顶之间的形状过渡中涉及到了Ge岛的亚稳形状。随着岛从棱锥增长到亚稳形式,然后到圆顶,应变松弛不连续地变化,表明棱锥和圆顶之间的形状过渡是一阶的。我们还表明,该亚稳岛的形状为截顶穹顶,且刻面为{103}。

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