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Structure of single-crystal Gd_2O_3 films on GaAs (100)

机译:GaAs上的单晶Gd_2O_3膜的结构(100)

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摘要

We have studied the single-crystal Gd_2O_3 films grown epitaxially on GaAs (100) substrate with single-crystal x-ray diffraction. The sesquioxide Gd_2O_3 forms two hexagonal phases, one monoclinic and one cubic phase in bulk form. In our studies of different thickness films, we have found that the Gd_2O_3 grows only in the cubic phase with a unique epitaxial orientation. The two-fold (110) planes of the Gd_2O_3 are oriented parallel to the four-fold GaAs within the plane, respectively. The film chooses only one of the two such possible orientations, which can be explained by the local bonding configuration at the interface. We find evidence for an elastic strain in the films less than 50 A thick.
机译:我们用单晶X射线衍射研究了在GaAs(100)衬底上外延生长的单晶Gd_2O_3薄膜。倍半氧化物Gd_2O_3形成两个六方相,一个单斜相和一个立方相。在研究不同厚度的薄膜时,我们发现Gd_2O_3仅在具有独特外延取向的立方相中生长。 Gd_2O_3的二重(110)平面分别平行于该平面内的四重GaAs定向。膜仅选择两个可能的方向之一,这可以通过界面处的局部键合配置来解释。我们发现在厚度小于50 A的薄膜中出现弹性应变的证据。

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