Procedure for obtaining Thin metal Films (1 - 100 micrometers in Thickness) are not supported (free standing Films), which presents the possibility to transfer its Surface nano / microstructures from the substrate.

摘要

Procedure for obtaining Thin metal Films (1 - 100 micrometers in Thickness) are not supported (free standing Films), which presents the possibility of transferring to its Surface nano / micro structures from the substrate. The substrate is immersed in a solution of an alkanethiol in toluene or alcohol. Washing with pure solvent.The deposited material to prepare the film. From the film of the substrate by means of tweezers. Used in the production of devices for Microelectronics, sensors, information storage on Magnetic Media, Metallurgy.