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GROWTH OF CVD DIAMOND ON Ta COVERED WC-6Co SUBSTRATE

机译:Ta覆盖WC-6%Co基质上CVD金刚石的生长

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摘要

Diamond thin films were deposited by hot filament CVD method on WC-6% Co substrate which were preheated by direct radiation from Ta filament at pure hydrogen atmosphere. X-ray diffraction and SEM were carried out to character the surface structure and morphology. Ta evaporated on the WC-6%Co surface is -beneficial to enhance both diamond quality and the adhesion.
机译:金刚石薄膜通过热丝CVD法沉积在WC-6%Co衬底上,并在纯氢气气氛下通过Ta丝的直接辐射进行预热。 X射线衍射和SEM进行了表征表面结构和形态。在WC-6%Co表面上蒸发的Ta有利于增强金刚石质量和附着力。

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