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Optimized sulfur treatment of AlGaAs surfaces: application to the passivation of dry-etched AlGaAs laser facets

机译:优化的AlGaAs表面硫处理:应用于干法蚀刻AlGaAs激光刻面的钝化

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摘要

As determined by XPS, the surface chemistry of Al_(0.4)Ga_(0.6)As is reported after successive Na_2S/(NH_4)_2S treatments. The striking features are the total surface deoxidization, the absence of elemental arsenic and the neutralization of most of the dangling bonds by the formation of As-S and Ga-S surface bonds.
机译:根据XPS的测定,在连续的Na_2S /(NH_4)_2S处理后,报道了Al_(0.4)Ga_(0.6)As的表面化学性质。显着的特征是总表面脱氧,不存在元素砷以及通过形成As-S和Ga-S表面键来中和大多数悬挂键。

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