首页> 外文会议>State-of-the-art program on compound semiconductors 52 (SOTAPOCS 52) >Flip-Chip Packaging of In_(0.6)Ga_(0.4)As MHEMT Device on Low-Cost Organic Substrate for W-Band Applications
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Flip-Chip Packaging of In_(0.6)Ga_(0.4)As MHEMT Device on Low-Cost Organic Substrate for W-Band Applications

机译:用于W波段应用的低成本有机衬底上的In_(0.6)Ga_(0.4)As MHEMT器件的倒装芯片封装

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摘要

A discrete low noise In_(0.6)Ga_(0.4)As MHEMT device with 150 nm gate length was flip-chip assembled on the low-cost RO3210 organic substrate for wireless communication applications. The measured DC characteristics were very similar before and after flip-chip assembly. The flip-chip packaged MHEMT device showed a high drain current density of 516 mA/mm and a maximum transconductance of 576 mS/mm at a V_(DS) of 0.8 V. The insertion gain of the flip-chip packaged device was decayed less than 2 dB up to 100 GHz as compared to the data of bare die. Moreover, the measured minimum noise figure was less than 2 dB as measured at V_(DS) of 0.7 V and V_(GS) of -0.7 V in the frequency range from 20 to 64 GHz for the device after flip-chip assembly. The excellent performance of the flip-chip packaged MHEMT device demonstrates the feasibility of using low cost organic substrate for high frequency applications up to W band.
机译:将具有150 nm栅极长度的离散低噪声In_(0.6)Ga_(0.4)As MHEMT器件倒装芯片组装在用于无线通信应用的低成本RO3210有机基板上。倒装芯片组装前后,测得的直流特性非常相似。倒装芯片封装的MHEMT器件在V_(DS)为0.8 V时显示出516 mA / mm的高漏极电流密度和576 mS / mm的最大跨导。倒装芯片封装的器件的插入增益衰减较小。与裸裸片的数据相比,在高达100 GHz的频率下超过2 dB。此外,对于倒装芯片组装后的器件,在20至64 GHz的频率范围内,在0.7 V的V_(DS)和-0.7 V的V_(GS)下测得的最小噪声系数小于2 dB。倒装芯片封装的MHEMT器件的出色性能证明了将低成本有机基板用于高达W频段的高频应用的可行性。

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  • 会议地点 Las Vegas NV(US);Las Vegas NV(US);Las Vegas NV(US)
  • 作者单位

    Department of Materials Science and Engineering, National Chiao Tung University,R403, MIRC. 1001 University Rd., Hsinchu, Taiwan 30010, R.O.C.;

    Department of Materials Science and Engineering, National Chiao Tung University,R403, MIRC. 1001 University Rd., Hsinchu, Taiwan 30010, R.O.C.;

    Department of Materials Science and Engineering, National Chiao Tung University,R403, MIRC. 1001 University Rd., Hsinchu, Taiwan 30010, R.O.C.;

    Department of Materials Science and Engineering, National Chiao Tung University,R403, MIRC. 1001 University Rd., Hsinchu, Taiwan 30010, R.O.C.;

    Department of Materials Science and Engineering, National Chiao Tung University,R403, MIRC. 1001 University Rd., Hsinchu, Taiwan 30010, R.O.C.;

    Department of Materials Science and Engineering, National Chiao Tung University,R403, MIRC. 1001 University Rd., Hsinchu, Taiwan 30010, R.O.C.;

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  • 正文语种 eng
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