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Influence of process parameters on properties of piezoelectric A1N and AlScN thin films for sensor and energy harvesting applications

机译:工艺参数对压电A1N和AlScN薄膜性能的影响,用于传感器和能量收集应用

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This paper reports on the deposition of A1N and Al_xSci_(1-x)N films by pulse magnetron sputtering. The influence of process parameters on the film properties and the evaluation of the films for micro energy harvesting are presented. For A1N it is shown, that film stress can be varied in a considerable range between compressive and tensile stress while maintaining good piezoelectric properties. Additionally, the effect of doping A1N with Sc regarding piezoelectric and mechanical properties is presented. The films show the expected increase of piezoelectric properties as well as the softening of the material with higher Sc concentrations. Above a threshold concentration of around 40% Sc in the Al_xSci_(1-x)N films, there exists a separation into two phases, an Al-rich and a Sc-rich wurtzite phase, which is shown by XRD. At Sc concentrations higher than 50%, the films are not piezoelectric, as the films are composed primarily of the cubic ScN phase. Sc doping allows to significantly increase the energy generated in test setup. Up to 350 uW power have been generated under optimum conditions.
机译:本文报道了通过脉冲磁控溅射沉积AlN和Al_xSci_(1-x)N薄膜的方法。提出了工艺参数对薄膜性能的影响以及薄膜的微能收集评估。对于AlN,表明在保持良好的压电性能的同时,膜应力可以在压应力和拉应力之间的相当大的范围内变化。此外,提出了用Sc掺杂AlN对压电和机械性能的影响。薄膜显示出预期的压电性能增强以及较高Sc浓度的材料的软化。在Al_xSci_(1-x)N膜中的阈值浓度高于约40%Sc时,存在分离为两相的现象:富Al和富Sc纤锌矿相,这由XRD显示。当Sc浓度高于50%时,薄膜不是压电薄膜,因为薄膜主要由立方ScN相组成。 Sc掺杂可以显着增加测试设置中产生的能量。在最佳条件下,最多可产生350 uW的功率。

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