Univ. Grenoble Alpes, CEA, LETI, Minatec Campus, F38054 Grenoble, France;
Univ. Grenoble Alpes, CEA, LETI, Minatec Campus, F38054 Grenoble, France;
Univ. Grenoble Alpes, CEA, INAC, Minatec Campus, F38054 Grenoble, France;
Univ. Grenoble Alpes, CEA, INAC, Minatec Campus, F38054 Grenoble, France;
Univ. Grenoble Alpes, CEA, INAC, Minatec Campus, F38054 Grenoble, France;
Univ. Grenoble Alpes, CEA, INAC, Minatec Campus, F38054 Grenoble, France;
Univ. Grenoble Alpes, CEA, LETI, Minatec Campus, F38054 Grenoble, France;
Univ. Grenoble Alpes, CEA, LETI, Minatec Campus, F38054 Grenoble, France;
Univ. Grenoble Alpes, CEA, LETI, Minatec Campus, F38054 Grenoble, France;
Univ. Grenoble Alpes, CEA, INAC, Minatec Campus, F38054 Grenoble, France;
Univ. Grenoble Alpes, CEA, LETI, Minatec Campus, F38054 Grenoble, France;
GeSn alloy; optical components; laser; etching process; photoluminescence;
机译:级联反应离子刻蚀/电感耦合等离子体刻蚀InGaAsP / InP双浅脊矩形环形激光光子集成电路的制备与表征
机译:级联反应离子刻蚀/电感耦合等离子体刻蚀InGaAsP / InP双浅脊矩形环形激光光子集成电路的制备与表征
机译:基于InP的光子集成电路的电感耦合等离子体干法刻蚀制造表面光栅
机译:锗锡的电感耦合等离子体蚀刻光子部件的制备
机译:在感应耦合等离子体反应器中研究碳氟化合物沉积和蚀刻对硅和二氧化硅蚀刻工艺的影响(使用三氟化甲基),并开发了用于研究等离子体与表面相互作用机理的反应离子束系统。
机译:使用各向同性电感耦合等离子体蚀刻的硅纳米尖端批量制造
机译:通过电感耦合等离子体刻蚀和快速湿法刻蚀制备高品质因子GaAs / InAsSb光子晶体微腔