Department of Material and Life Science, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan;
Department of Material and Life Science, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan;
Department of Material and Life Science, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan;
New Material Devices RD Center, ROHM Co., Ltd., 21 Saiin, Mizosaki-cho, Ukyo-ku, Kyoto 615-8585, Japan;
New Material Devices RD Center, ROHM Co., Ltd., 21 Saiin, Mizosaki-cho, Ukyo-ku, Kyoto 615-8585, Japan;
New Material Devices RD Center, ROHM Co., Ltd., 21 Saiin, Mizosaki-cho, Ukyo-ku, Kyoto 615-8585, Japan;
Department of Material and Life Science, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan;
Department of Material and Life Science, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan;
MOS device; UV-induced damage; carbon-related defect; interface state density;
机译:通过紫外线照射和随后的热退火改善4H-SiC MOS器件界面质量的新方法
机译:在潮湿的O_2和N_2O环境中进行后氧化退火对p沟道MOS器件热生长的SiO_2 / 4H-SiC界面的影响
机译:紫外线辐射对热生长4H-SiC MOS器件的影响
机译:用UV辐照和随后的热退火改善4H-SIC MOS装置界面质量的新方法
机译:UV-C辐射对使用新型流动连续UV系统进行蔓越莓味水的安全和质量的影响
机译:用于钨二硒化物器件的共形六方氮化硼氮化物介电界面具有改善的迁移率和散热
机译:快速热退火Al / SiNx中的低界面陷阱密度:H / InP金属-绝缘体-半导体器件
机译:最终报告:中子辐照在低温和后续退火对铍的热导率和电阻率的影响