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Full Simulation Study of UV Photodetectors based on pn junctions in Silicon Carbide

机译:碳化硅中基于pn结的紫外光电探测器的完整仿真研究

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摘要

This paper deals with optical and electrical simulations of 4H-SiC UV-Photodetectors based on pn junctions. The simulations are performed under the UV light, with wavelengths varying between 200 nm and 300 nm. Under reverse bias, the simulation results point out the influence of surface patterns on the current density. The studied structures of the patterns consist in a semicircle with or without a flat surface. The patterned surfaces are parametrized according to the semicircle radius R and the flat surface length L. We show that the optical absorption strongly depends on these parameters, giving a maximum value whatever the wavelength with R = 100 nm and L = 0 nm (no flat surface). However, to optimise the carrier harvest, it is important for the space charge region to be situated in a zone where the optical generation is high. This study shows that the photodetector current density increases within three orders of magnitude (from 9×10~(-14) A.cm~(-2) to 3×10~(-10) A.cm~(-2)), by using the specific surface pattern given above.
机译:本文研究了基于pn结的4H-SiC紫外光电探测器的光学和电气模拟。模拟是在波长为200 nm至300 nm的紫外线下进行的。在反向偏置下,仿真结果指出了表面图案对电流密度的影响。研究的图案结构为具有或没有平坦表面的半圆形。图案化的表面根据半圆半径R和平坦表面长度L进行了参数化。我们表明,光吸收在很大程度上取决于这些参数,无论R = 100 nm和L = 0 nm的波长如何,其吸光度都为最大值(不平坦)表面)。然而,为了优化载流子的收获,重要的是将空间电荷区域设置在光产生高的区域中。研究表明,光电探测器电流密度在三个数量级内增加(从9×10〜(-14)A.cm〜(-2)到3×10〜(-10)A.cm〜(-2)) ,使用上面给出的特定表面图案。

著录项

  • 来源
  • 会议地点 St. Petersburg(RU)
  • 作者单位

    IM2NP (UMR 7334), Aix-Marseille University, Faculte des Sciences - service 231, Av. Escadrille Normandie Niemen, 13397 Marseille Cedex 20, France;

    IM2NP (UMR 7334), Aix-Marseille University, Faculte des Sciences - service 231, Av. Escadrille Normandie Niemen, 13397 Marseille Cedex 20, France;

    AMPERE (UMR 5005) - INSA de Lyon, 21 av. Capelle, Bat. Leonard de Vinci, 69621 Villeurbanne, France;

    IM2NP (UMR 7334), Aix-Marseille University, Faculte des Sciences - service 231, Av. Escadrille Normandie Niemen, 13397 Marseille Cedex 20, France;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    SiC; UV Photodiode; FEM; FDTD; dark current; surface pattern;

    机译:碳化硅;紫外线光电二极管有限元FDTD;暗电流表面图案;

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