首页> 外国专利> Silicon carbide bipolar junction transistors having a silicon carbide passivation layer on the base region thereof

Silicon carbide bipolar junction transistors having a silicon carbide passivation layer on the base region thereof

机译:在其基极区域上具有碳化硅钝化层的碳化硅双极结型晶体管

摘要

A bipolar junction transistor (BJT) includes a silicon carbide (SiC) collector layer of first conductivity type, an epitaxial silicon carbide base layer of second conductivity type on the silicon carbide collector layer, and an epitaxial silicon carbide emitter mesa of the first conductivity type on the epitaxial silicon carbide base layer. An epitaxial silicon carbide passivation layer of the first conductivity type is provided on at least a portion of the epitaxial silicon carbide base layer outside the silicon carbide emitter mesa. The epitaxial silicon carbide passivation layer can be configured to fully deplete at zero device bias. Related fabrication methods also are disclosed.
机译:双极结型晶体管(BJT)包括第一导电类型的碳化硅(SiC)集电极层,位于碳化硅集电极层上的第二导电类型的外延碳化硅基极层和第一导电类型的外延碳化硅发射极台面在外延碳化硅基层上。在碳化硅发射极台面外部的外延碳化硅基层的至少一部分上提供第一导电类型的外延碳化硅钝化层。可将外延碳化硅钝化层配置为在零器件偏压下完全耗尽。还公开了相关的制造方法。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号