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Full Simulation Study of UV Photodetectors based on pn junctions in Silicon Carbide

机译:基于碳化硅PN结的UV光电探测器全仿真研究

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This paper deals with optical and electrical simulations of 4H-SiC UV-Photodetectors based on pn junctions. The simulations are performed under the UV light, with wavelengths varying between 200 nm and 300 nm. Under reverse bias, the simulation results point out the influence of surface patterns on the current density. The studied structures of the patterns consist in a semicircle with or without a flat surface. The patterned surfaces are parametrized according to the semicircle radius R and the flat surface length L. We show that the optical absorption strongly depends on these parameters, giving a maximum value whatever the wavelength with R = 100 nm and L = 0 nm (no flat surface). However, to optimise the carrier harvest, it is important for the space charge region to be situated in a zone where the optical generation is high. This study shows that the photodetector current density increases within three orders of magnitude (from 9×10~(-14) A.cm~(-2) to 3×10~(-10) A.cm~(-2)), by using the specific surface pattern given above.
机译:本文基于pn结的4H-SiC UV-光探测器的光学和电学模拟交易。该模拟是在UV光下进行,用波长为200nm和300nm的之间变化。在反向偏压下,模拟结果指出的表面图案上的电流密度的影响。图案的研究结构由在具有或不具有平坦表面的半圆。所述图案化表面被根据半圆半径R和平坦表面长度L.我们表明,光吸收强烈地依赖于这些参数,给出最大值参数化任何与R = 100 nm和L = 0处(没有平坦的波长表面)。然而,为了优化载体收获,重要的是用于向在所述光产生高的区域中位于所述空间电荷区。这项研究表明,三个数量级内的光检测器的电流密度的增加(从9×10〜(-14)A.cm〜(-2)到3×10〜(-10)A.cm〜(-2))通过使用上面给出的特定表面图案。

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