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Design of Low-Noise Output Amplifiers for P-channel Charge-Coupled Devices Fabricated on High-Resistivity Silicon

机译:用于高电阻率硅上的P沟道电荷耦合器件的低噪声输出放大器的设计

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We describe the design and optimization of low-noise, single-stage output amplifiers for p-channel charge-coupled devices (CCDs) used for scientific applications in astronomy and other fields. The CCDs are fabricated on high-resistivity, 4000-5000 Ω-cm, n-type silicon substrates. Single-stage amplifiers with different output structure designs and technologies have been characterized. The standard output amplifier is designed with an n~+ polysil-icon gate that has a metal connection to the sense node. In an effort to lower the output amplifier readout noise by minimizing the capacitance seen at the sense node, buried-contact technology has been investigated. In this case, the output transistor has a p~+ polysilicon gate that connects directly to the p~+ sense node. Output structures with buried-contact areas as small as 2 μm × 2 μm are characterized. In addition, the geometry of the source-follower transistor was varied, and we report test results on the conversion gain and noise of the various amplifier structures. By use of buried-contact technology, better amplifier geometry, optimization of the amplifier biases and improvements in the test electronics design, we obtain a 45% reduction in noise, corresponding to 1.7 e~- rms at 70 kpixels/sec.
机译:我们描述了用于天文学和其他领域的科学应用的p沟道电荷耦合器件(CCD)的低噪声单级输出放大器的设计和优化。 CCD是在高电阻率4000-5000Ω-cm的n型硅基板上制造的。具有不同输出结构设计和技术的单级放大器已经被表征。标准输出放大器设计有n〜+多晶硅栅极,该栅极与检测节点之间具有金属连接。为了通过最小化在感测节点上看到的电容来降低输出放大器的读出噪声,已经研究了埋入式接触技术。在这种情况下,输出晶体管具有直接连接到p〜+感测节点的p〜+多晶硅栅极。表征了埋入接触面积小至2μm×2μm的输出结构。此外,源极跟随器晶体管的几何形状也有所变化,我们报告了各种放大器结构的转换增益和噪声的测试结果。通过使用埋入式接触技术,更好的放大器几何形状,放大器偏置的优化以及测试电子设备设计的改进,我们获得了噪声降低45%的效果,相当于70 kpixels / sec时的1.7 erms。

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